COURSE
A: "Projection Technology for Flight Simulation Displays"
COURSE LEVEL: Intermediate
DATE & TIME: 7 June - Tuesday, 7:00-9:00pm
INSTRUCTOR: Mark Green, Rockwell Collins STS
COURSE CONTENT:
This course reviews the basic principles for simulation projection systems (resolution, luminance and contrast; geometry and collimation) and then moves on to a detailed review of relevant display technologies: LCD, LCOS and DLP projection: basic principles; architectures; single-panel; 3-panel; performance analysis; design trade-offs, illumination options, motion blur, artifacts; technology trends. After that, display system designs and issues are addressed:
- Front projection: domes and dome segments; the integrating sphere problem; screen gain benefits and trade-offs.
- Rear projection systems: screens; configurations; system performance.
- Collimated projection systems: mirrors, BP screens, vergence.
WHO SHOULD ATTEND:
This is an intermediate level class that will be understandable to people with an engineering background or a general understanding and familiarity with visual simulation equipment.
KNOWLEDGE & SKILLS TO BE ATTAINED:
Individuals attending this course should gain a general appreciation of the problems and solutions commonly met and used in the field of visual display technology, particularly as it affects projection display systems used in the simulation industry, the technology options available and their relative merits and trade-offs.
TUTOR'S VITA:
Mark Green joined Evans & Sutherland in 1982 as an engineer in the Displays Systems department and currently is a Principal Systems Engineer for Rockwell Collins (which acquired the simulation assets of Evans & Sutherland in 2006). Mark was involved in the design of several types of CRT displays. He has served as project engineer on several simulation projects incorporating various types of display devices, including CRT, LCD, DLP and LCoS projectors. Mr. Green holds a B.S. in Physics and an M.S. in Instrumentation Physics. He is a member of the IMAGE Society.